Pfeiffer ACP Series Dry Lobe Pumps

Description Pfeiffer ACP Series Dry Lobe Pumps The Pfeiffer ACP series of dry lobe (or multi-stage roots) pumps offer many distinct advantages over other displacement pumps including: Dry multi-stage Roots technology, SD versions, ACP pumps with a pumping speed of max. 15, 28, and 40 m3/h No particle contamination, thanks to frictionless design: no wearing parts in the pumped gases path No hydrocarbon vapors backstreaming: ACP series pumps are free of lubricant inside the pumping module Constant performances (Pumping speed, max. and ultimate pressure) High reliability Low maintenance costs: no annual field service, complete overhaul only every 20,000 hours for ACP 15; 22,000 ours for ACP 28/40 Condensable vapor ability: with gas ballast ports and drainable sileAir-cooled multi-stage Roots pumps from the ACP series are very low maintenance and stand out with their constant performance. They are used in analytical applications as well as in clean processes for semiconductor production and plasma cleaning. These compact pumps can be easily integrated in systems due to their small dimensions.The SD-version is designed for applications with clean (dust-free) and non-corrosive gases. The standard pumps are equipped with gas ballast equipment in order to improve the pumping of light gases and to avoid the condensation of steam inside the pumps. Three gas ballast options fulfill the customer requirements as needed.ncer